Fast-Reconfigurable Interference Lithography
A Unique And Pioneering Technology
Reconfigurable Beam Delivery
The periodicity of the interfering nanopattern is determined by the angle between two beams. Adjusting the beam angle on a conventional IL system is complex, time-consuming, and requires professional skills.
Our interference nanopatterning systems employ flexible beam delivery with motorized positioning, achieving a fast reconfiguration of periodicity via semi- or fully automated adjustment. The reconfigurable beam delivery module in our standard model enables fast periodicity tuning from 240 nm to 1500 nm with 2% accuracy or better.
Active Interfering Pattern Stabilization (AIPS)
Nanopatterns recorded in photoresist directly reflect the periodic intensity distribution of the interference patterns. To obtain high-quality nanostructures, a highly stabilized interfering intensity distribution is critical, which is mainly affected by environmental disturbance and mechanical vibration. Our AIPS module employs innovative optical design, precise electronics, and advanced embedded firmware algorithm to automatically compensate phase variations with a high refresh rate. The AIPS module is essential for high-quality interference nanopatterning with vertical sidewalls and high aspect ratios.
Precision Optomechanics
High-quality precision design in our interference nanopatterning systems adopts fine optomechanical components for accurate beam splitting, efficient beam delivering, and stable beam pointing. The optomechanical system can achieve 0.1° accuracy in the beam angle to get highly accurate pattern periodicity.
The solid and stable rails and motorized stages enable unprecedented automation in interference patterning with highly suppressed mechanical variation to achieve high interference pattern contrast.
Our interference patterning modules are assembled on an air-suspension optical table with a specially designed enclosure to further eliminate the mechanical and environmental disturbance.
Sample Positioning
The multiple-axis sample positioning module in our interference nanopatterning systems has a bidirectional positioning repeatability of 4 microns and a rotation accuracy of 0.1°, which allows for precisely defining the pattern lattice and exposure field positions.
Supporting components made of lightweight aluminum alloy mitigate mechanical vibrations. The computer-controlled sample positioning significantly improves patterning speed and enables automatic patterning of multiple exposure fields. The sample stage also contains a pneumatic exposure shutter that provides accurate exposure time control.
Pattern Size Modulation
Our interference nanopatterning systems can integrate our patented pattern size modulation module (optional to HIL and VIL series) for fine-tuning the filling ratio of 1D and 2D structures from a micrometer scale to a wafer scale after interference exposure. It can compensate for the spatial variation of feature sizes caused by the Gaussian beam profile during IL for further improved uniformity. The module also produces arbitrarily designed spatial distribution of feature sizes that benefit applications in meta-optics, displays, nanophotonics, etc.
